Sputtering yields of YBa2Cu3O7 and Bi2Sr2Ca2Cu3O10 by 100 keV Ar+ impact at normal incidence

被引：4

作者：

Matsunami, N ^{[1
]}

机构：

[1] Nagoya Univ, Sch Engn, Chikusa Ku, Nagoya, Aichi 46401, Japan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1998年 / 134卷 / 3-4期

关键词：

79.20; Nc; 74.76;

D O I：

10.1016/S0168-583X(97)00919-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The thickness change of YBa2Cu3O7-delta (YBCO) and Bi2Sr2Ca2Cu3O10-delta (Bi-2223) films by 100 keV Ar+ impact at normal incidence has been measured using 1.8 MeV He Rutherford backscattering method. The sputtering yields of YBCO and Bi-2223 films are determined as 2.5 and 1.7 atoms per ion, respectively. A considerable segregation of Y is observed for YBCO by ion impact. Comparing the experimental sputtering yields with those of a computer simula tion, the effective surface binding energies fur the films of non-superconducting phase are obtained as 3.0 and 4.5 eV for YBCO and Bi-2223, respectively. These surface binding energies are compared with those of thermodynamics. (C) 1998 Elsevier Science B.V.

引用

页码：346 / 351

页数：6

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