AFM observation for the change of surface morphology of TPD thin films due to thermal annealing

被引：14

作者：

Mandai, M

Takada, K

Aoki, T

Fujinami, T

Nakanishi, Y

Hatanaka, Y

机构：

[1] Shizuoka Univ, Elect Res Inst, Hamamatsu, Shizuoka 432, Japan

[2] Shizuoka Univ, Grad Sch Elect Sci & Technol, Hamamatsu, Shizuoka 432, Japan

[3] Shizuoka Univ, Fac Engn, Hamamatsu, Shizuoka 432, Japan

来源：

SYNTHETIC METALS | 1997年 / 91卷 / 1-3期

关键词：

atomic force microscopy; surface morphology; triphenyldiamine derivative; thin films; thermal annealing; electroluminescence;

D O I：

10.1016/S0379-6779(98)80070-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The dependence of the surface morphology of triphenyldiamine derivative (TPD) thin films on the deposition rate was observed by atomic force microscopy (AFM). Moreover, electroluminescent (EL) properties as a function of the TPD deposition rate were also measured. It was found that a deposition rate of around 3 Angstrom/s is the optimum for the flatness of the films and EL properties. (C) 1997 Elsevier Science S.A.

引用

页码：123 / 124

页数：2

共 3 条

[1] Doped organic electroluminescent devices with improved stability [J].