Self-organized nanoscale multilayer growth in hyperthermal ion deposition -: art. no. 245418

被引:31
作者
Gerhards, I
Stillrich, H
Ronning, C
Hofsäss, H
Seibt, M
机构
[1] Univ Gottingen, Inst Phys 2, D-37077 Gottingen, Germany
[2] Univ Gottingen, Inst Phys 4, D-37077 Gottingen, Germany
关键词
D O I
10.1103/PhysRevB.70.245418
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In the course of thin film growth by co-deposition of low energy mass selected carbon and metal (Au or Fe) ions, an effect of self-organization was found. Although carbon and metal ions were deposited quasi-simultaneously, a multilayer film structure of alternately metal-rich and metal-deficient layers was grown. The period of these layers is of the order of a few nanometers (similar to6-20 nm), and the metal-rich layers consist of metallic nanocrystals. The multilayer formation process is discussed in comparison with earlier studies on C-Cu and C-Ag films with respect to the structural properties of small clusters of the different metals, the influence of sputtering yields, and the deposition parameters. For a variety of compound thin film materials we expect a multilayer structure to develop during simultaneous sputter deposition or ion beam deposition of the components. The suppositions for this scenario are: (a) the deposited elements are immiscible or there are immiscible phases of a compound material, (b) the sputtering yields of the film components imposed by the impinging species are in an appropriate range, and (c) one compound segregates at the surface.
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页码:1 / 8
页数:8
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