A systematic investigation of the effect of the material and the structural parameters on the hole states in strained p-Si/Si1-xGex/p-Si selectively doped double heterojunctions structures

被引:3
作者
Hionis, G [1 ]
Triberis, GP [1 ]
机构
[1] Univ Athens, Dept Phys, Sect Solid State Phys, GR-15784 Athens, Greece
关键词
D O I
10.1006/spmi.1997.0466
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The hole wavefunctions, the energy levels and the sheet density of a strained p-Si/Si1-xGex/p-Si selectively doped double heterojunction are investigated at T = 0 K, solving the Schrodinger and Poisson equations self-consistently. We present a systematic study taking into account all the modulation parameters involved, i.e. the well width, the spacer thickness and the doping concentration, for x = 0.2. We give physical interpretations of the interesting characteristics observed. Our results are in very good agreement with experiment. (C) 1997 Academic Press Limited.
引用
收藏
页码:285 / 294
页数:10
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