A Device-to-System Perspective Regarding Self-Heating Enhanced Hot Carrier Degradation in Modern Field-Effect Transistors: A Topical Review

被引:59
作者
Alam, Muhammad Ashraful [1 ]
Mahajan, Bikram Kishore [1 ]
Chen, Yen-Pu [1 ]
Ahn, Woojin [1 ]
Jiang, Hai [1 ]
Shin, Sang Hoon [1 ]
机构
[1] Purdue Univ, Dept ECE, W Lafayette, IN 47907 USA
关键词
Temperature dependence; Lattices; MOSFET; Mathematical model; Degradation; Data models; FinFETs; hot carrier degradation (HCD); power electronics; self-heating effect; universal scaling; GATE DIELECTRIC-BREAKDOWN; ENERGY-DRIVEN PARADIGM; NEGATIVE CAPACITANCE; COMPREHENSIVE MODEL; NBTI DEGRADATION; HIGH-VOLTAGE; SOI; RELIABILITY; DESIGN; FINFET;
D O I
10.1109/TED.2019.2941445
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As foreseen by Keyes in the late 1960s, the self-heating effect has emerged as an important concern for device performance, output power density, run-time variability, and reliability of modern field-effect transistors. The self-heating effect is aggravated as the device footprint scales down for higher level of integration (low-power devices) or as the devices are operated in ultrahigh voltage regimes (high-power devices). In this article, we focus on the implications of self-heating on hot carrier degradation (HCD) of modern transistors by integrating within a coherent theoretical framework a broad range of experimental data scattered in the literature. We explain why system integration exacerbates transistor self-heating, while high-frequency digital operation ameliorates it, suggesting an opportunity for co-optimization. We conclude this article by discussing the various material-device-system design strategies to reduce HCD and suggesting open problems for further research.
引用
收藏
页码:4556 / 4565
页数:10
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