Microstructural control of (Ca,Sr)RuO3 electrode and the related properties of (Ba,Sr)TiO3 thin films

被引：0

作者：

Son, SY ^{[1
]}

Kim, BS

Choi, DK

Lee, KS

Dai, ZR

Ohuchi, FS

机构：

[1] Hanyang Univ, Dept Inorgan Mat Engn, Seoul 133791, South Korea

[2] Hanyang Univ, Dept Mat Engn, Seoul 133791, South Korea

[3] Univ Washington, Dept Mat Sci & Engn, Seattle, WA 98190 USA

来源：

JOURNAL OF THE KOREAN PHYSICAL SOCIETY | 1998年 / 32卷

关键词：

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Relation between the microstructure of (Ca,Sr)RuO3 electrode and the properties of (Ba,Sr)TiO3 thin films was investigated. The (Ca,Sr)RuO3 electrodes and (Ba,Sr)TiO3 films were deposited by means of RF magnetron sputtering using a composite target. By changing Sr/Ca ratios in the target, we were able to control the lattice parameters and surface morphology of (Ca,Sr)RuO3 films. All the (Ba,Sr)TiO3 films were deposited at the identical conditions on the (Ca,Sr)RuO3 films in order to compare the properties of the resultant thin films. High resolution electron microscopy was used to study the interface structure between (Ba,Sr)TiO3 and (Ca,Sr)RuO3. The leakage current density level was about one order lower than that of (Ba,Sr)TiO3/RuO2 processed at the same laboratory conditions. Measured dielectric constant for (Ba,Sr)TiO3 had a slight dependence on the chemical composition of the underneath (Ca,Sr)RuO3 electrodes.

引用

页码：S1517 / S1520

页数：4

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