Laser-assisted chemical vapor deposition to directly write three-dimensional microstructures

被引:3
作者
Han, SI [1 ]
Jeong, SH [1 ]
机构
[1] Kangju Inst Sci & Technol, Dept Mechatron, Kwangju 500712, South Korea
关键词
D O I
10.2351/1.1771199
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Application of laser-assisted chemical vapor deposition to the fabrication of three-dimensional microstructures is investigated. To fabricate a three-dimensional microstructure, a thin layer of deposit in desired patterns is first written on a flat substrate using the laser-direct-writing technique and on top of this layer a second layer is deposited to increase the height of the deposit pattern. After repeatedly depositing several layers in the same manner, a three-dimensional microstructure is fabricated. Optimum deposition conditions for direct writing of initial and subsequent layers with good surface quality and profile uniformity are determined. Using an argon ion laser and ethylene as the light source and reaction gas, respectively, fabrication of three-dimensional carbon microstructures is demonstrated. (C) 2004 Laser Institute of America.
引用
收藏
页码:154 / 159
页数:6
相关论文
共 16 条
[1]   LASER CHEMICAL VAPOR-DEPOSITION - A TECHNIQUE FOR SELECTIVE AREA DEPOSITION [J].
ALLEN, SD .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) :6501-6505
[2]  
Bauerle D, 1998, PHYS STATUS SOLIDI A, V166, P543, DOI 10.1002/(SICI)1521-396X(199804)166:2<543::AID-PSSA543>3.0.CO
[3]  
2-P
[4]  
Bauerle D., 2000, ADV TEXTS PHYS
[5]   LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF ALUMINUM [J].
BAUM, TH ;
LARSON, CE ;
JACKSON, RL .
APPLIED PHYSICS LETTERS, 1989, 55 (12) :1264-1266
[6]  
Chen Y., 1999, Materials Science Forum, V312-314, P375, DOI 10.4028/www.scientific.net/MSF.312-314.375
[7]   COMBINED EXPERIMENTAL AND MODELING STUDIES OF LASER-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF COPPER FROM COPPER(I)-HEXAFLUOROACETYLACETONATE TRIMETHYLVINYLSILANE [J].
HAN, JS ;
JENSEN, KF .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (04) :2240-2250
[8]  
*JCPDS ICDD, 411487 JCPDS ICDD
[9]   Carbon fiber growth kinetics and thermodynamics using temperature controlled LCVD [J].
Jean, D ;
Duty, C ;
Johnson, R ;
Bondi, S ;
Lackey, WJ .
CARBON, 2002, 40 (09) :1435-1445
[10]  
JEONG SH, 2002, P SOC PHOTO-OPT INS, V4330, P177