Generation and transport of submillisecond intense electron beams in plasma cathode vacuum diodes

被引：9

作者：

Astrelin, V. T. ^{[1
,3
]}

Kandaurov, I. V. ^{[1
]}

Vorobyov, M. S. ^{[2
]}

Koval, N. N. ^{[2
,4
]}

Kurkuchekov, V. V. ^{[1
,3
]}

Sulakshin, S. A. ^{[2
]}

Trunev, Yu A. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Nucl Phys, Siberian Branch, 11 Akad Lavrentieva Prospect, Novosibirsk 630090, Russia

[2] Russian Acad Sci, Inst High Current Elect, Siberian Branch, 2-3 Acad Sky Ave, Tomsk 634055, Russia

[3] Novosibirsk State Univ, 2 Pirogova Str, Novosibirsk 630090, Russia

[4] Natl Res Tomsk State Univ, 30 Lenin Ave, Tomsk 634050, Russia

来源：

VACUUM | 2017年 / 143卷

基金：

俄罗斯科学基金会;

关键词：

Electron beam; Plasma emitter; Low-pressure arc discharge; Multi-aperture diode; Vacuum diode; Plasma anode; EMITTER; GOL-3; TRAP;

D O I：

10.1016/j.vacuum.2017.03.025

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The paper reports on a comparative study of two different types of diode system for producing intense submillisecond electron beam in a source with low-pressure arc plasma emitter. The first is a planar multi-aperture diode comprising cathode and anode performed as molybdenum grids with 241 round openings of few millimeters in diameter. In the second system electrons are accelerated in a sheath between the grid-stabilized cathode plasma and the open boundary of beam-generated anode plasma. It was demonstrated in experiments that latter system should be advantageous in terms of maximally achievable beam current and total beam energy content, but there are drawbacks connected with slow anode plasma build-up that require further study. (C) 2017 Elsevier Ltd. All rights reserved.

引用

页码：495 / 500

页数：6

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