Atmospheric pressure chemical vapour deposition and characterisation of crystalline InTaO4, InNbO4 and InVO4 coatings

被引：18
作者：
Abrutis, A. [1 ]
Parafianovic, L. [1 ]
Kazlauskiene, V. [2 ]
Kubilius, V. [1 ]
Sauthier, G. [3 ]
Figueras, A. [3 ]
机构：
[1] Vilnius Univ, Fac Chem, LT-03225 Vilnius, Lithuania
[2] Vilnius Univ, Inst Mat Sci & Appl Res, LT-10222 Vilnius, Lithuania
[3] Ctr Invest Nanociencia & Nanotecnol CIN2, Bellaterra 08193, Spain
来源：
SURFACE & COATINGS TECHNOLOGY | 2010年 / 204卷 / 23期
关键词：
oxides; chemical vapour deposition; photocatalytic activity; crystalline structure; x-ray diffraction; photoelectron spectroscopy; THIN-FILMS; PHOTOCATALYSTS; METAL; XPS; V5+; FE; NI;
D O I：
10.1016/j.surfcoat.2010.05.002
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The possibilities to grow crystalline complex InTaO4, InNbO4 and InVO4 coatings as well as single oxide layers In2O3, Ta2O5, Nb2O5, and VOx were investigated using aerosol assisted atmospheric pressure chemical vapour deposition technique. Indium(III) and niobium(IV) tetramethylheptanedionates, tantalum(V) tetraethoxyacethylacetonate and vanadium(III) acethylacetonate were used as precursors, monoglyme and toluene as solvents. The influence of deposition conditions and solution composition on elemental and phase compositions of layers was studied. Indium tantalate layers containing pure monoclinic InTaO4 phase were obtained ex-situ, i.e., after high-temperature (800 degrees C) annealing of layers grown at lower temperature (500 degrees C). Films containing pure orthorhombic indium vanadate or monoclinic indium niobate phase may be prepared using both in-situ (600 degrees C) or ex-situ (deposition at 400 degrees C, annealing at 800 degrees C) approaches. Under optimised deposition conditions and solution compositions, Ni-doped InVO4 and InTaO4 films were also deposited and their photocatalytic activity was tested. (C) 2010 Elsevier B.V. All rights reserved.
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收藏
页码：3864 / 3870
页数：7
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