Growth and structural properties of Mg:C thin films prepared by magnetron sputtering

被引:17
作者
Ingason, A. S. [1 ]
Eriksson, A. K. [1 ]
Lewin, E. [2 ]
Jensen, J. [3 ]
Olafsson, S. [1 ]
机构
[1] Univ Iceland, Inst Sci, IS-107 Reykjavik, Iceland
[2] Uppsala Univ, Dept Chem Mat, Angstrom Lab, SE-751 Uppsala, Sweden
[3] IFM Linkoping Univ, Dept Phys Chem & Biol, Film Phys Div, SE-58183 Linkoping, Sweden
关键词
Magnesium; Carbon; In-situ resistance measurements; X-ray photoelectron spectroscopy; Magnetron sputtering; X-ray diffraction; Elastic recoil detection analysis; HYDROGEN ABSORPTION; CRYSTAL-STRUCTURE; MAGNESIUM;
D O I
10.1016/j.tsf.2009.12.082
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate the growth and structure properties of Mg:C thin films. The films are prepared using a dc magnetron sputtering discharge where the electrical resistance over the films is monitored during growth in-situ with a four point probe setup. The structural properties of the films are investigated using X-ray diffraction measurements and the elemental composition and binding in the films is determined using elastic recoil detection analysis and X-ray photoelectron spectroscopy. The results show that during co-sputtering the carbon flux influences the initial stages of the film growth. The films are made of polycrystalline magnesium grains embedded in a carbon network, the size of which depends on the carbon content, but amorphous phases cannot be excluded. The XPS measurements show the presence of carbidic carbon whereas X-ray measurements find no Mg:C phases. The overall stability of the films is found to depend on the carbon content, where stable films capped with a 14 nm Pd layer cannot be obtained with carbon content above 18%. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:4225 / 4230
页数:6
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