Evidence for a phosphorus-related interfacial defect complex at a GaP/GaNP heterojunction

被引:10
作者
Dagnelund, D. [1 ]
Vorona, I. P. [2 ]
Vlasenko, L. S. [3 ]
Wang, X. J. [1 ]
Utsumi, A. [4 ]
Furukawa, Y. [4 ]
Wakahara, A. [4 ]
Yonezu, H. [4 ]
Buyanova, I. A. [1 ]
Chen, W. M. [1 ]
机构
[1] Linkoping Univ, Dept Phys Chem & Biol, S-58183 Linkoping, Sweden
[2] Natl Acad Sci Ukraine, Inst Semicond Phys, UA-03028 Kiev, Ukraine
[3] AF Ioffe Phys Tech Inst, St Petersburg 194201, Russia
[4] Toyohashi Univ Technol, Dept Elect & Elect Engn, Aichi 4418580, Japan
基金
瑞典研究理事会;
关键词
RESONANCE; GAP; SILICON; SPIN; ODMR; STATES;
D O I
10.1103/PhysRevB.81.115334
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Optically detected magnetic resonance (ODMR) studies of molecular beam epitaxial GaNP/GaP structures reveal presence of a P-related complex defect, evident from its resolved hyperfine interaction between an unpaired electronic spin (S=1/2) and a nuclear spin (I=1/2) of a P-31 atom. The principal axis of the defect is concluded to be along a < 111 > crystallographic direction from angular dependence of the ODMR spectrum, restricting the P atom (either a P-Ga antisite or a P-i interstitial) and its partner in the complex defect to be oriented along this direction. The principal values of the electronic g tensor and hyperfine interaction tensor are determined as: g(perpendicular to) = 2.013, g(parallel to) = 2.002, and A(perpendicular to) = 130 x 10(-4) cm(-1), A(parallel to) = 330 x 10(-4) cm(-1), respectively. The interface nature of the defect is clearly manifested by the absence of the ODMR lines originating from two out of four equivalent < 111 > orientations. Defect formation is shown to be facilitated by nitrogen ion bombardment under nonequilibrium growth conditions and the defect is thermally stable upon post-growth thermal annealing.
引用
收藏
页数:7
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