Fractal analyses of ITO thin films: A study based on power spectral density

被引：81

作者：

Raoufi, Davood ^{[1
,2
]}

机构：

[1] Univ Bu Ali Sina, Dept Phys, Hamadan, Iran

[2] Univ Isfahan, Dept Phys, Quantum Opt Res Grp, Esfahan, Iran

来源：

PHYSICA B-CONDENSED MATTER | 2010年 / 405卷 / 01期

关键词：

ITO thin film; Electron beam evaporation; Power spectral density; INDIUM-TIN-OXIDE; LIGHT-EMITTING DEVICES; DIFFERENT ANNEALING TEMPERATURES; DETRENDED FLUCTUATION ANALYSIS; MULTIFRACTAL IMAGE-ANALYSIS; WAVELET-BASED METHOD; OPTICAL-PROPERTIES; ROUGH SURFACES; POROUS-MEDIA; MICROSTRUCTURE;

D O I：

10.1016/j.physb.2009.09.005

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

In this work it has been noticed that the topography of the annealed ITO thin film has very definite, dominant and predictable roles in the evolution of fractal and superstructures in ITO thin film topographies acquired by atomic force microscopy (AFM). It is found that, the spectral roughness of the films increases as the annealing temperature increases. The PSDs of all thin films exhibit inverse power law variation at the high spatial frequency region suggesting the existence of fractal components in the surface topographies. The fractal dimensions of the ITO film surfaces are in the range of 2.67-2.91. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：451 / 455

页数：5

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