The cross-magnetic-field (i.e., perpendicular) profile of ion temperature and the perpendicular profile of the magnetic-field-aligned (parallel) plasma flow are sometimes inhomogeneous for space and laboratory plasma. Instability caused either by a gradient in the ion-temperature profile or by shear in the parallel flow has been discussed extensively in the literature. In this paper, (1) hydrodynamic plasma stability is investigated, (2) real and imaginary frequency are quantified over a range of the shear parameter, the normalized wavenumber, and the ratio of density-gradient and ion-temperature-gradient scale lengths, and (3) the role of inverse Landau damping is illustrated for the case of combined ion-temperature gradient and parallel-flow shear. We find that increasing the ion-temperature gradient reduces the instability threshold for the hydrodynamic parallel-flow shear instability, also known as the parallel Kelvin-Helmholtz instability or the D'Angelo instability. We also find that a kinetic instability arises from the coupled, reinforcing action of both free-energy sources. For the case of comparable electron and ion temperature, we illustrate analytically the transition of the D'Angelo instability to the kinetic instability as (a) the shear parameter, (b) the normalized wavenumber, and (c) the ratio of density-gradient and ion-temperature-gradient scale lengths are varied and we attribute the changes in stability to changes in the amount of inverse ion Landau damping. We show that near a normalized wavenumber k(perpendicular to)rho(i) of order unity (i) the real and imaginary values of frequency become comparable and (ii) the imaginary frequency, i. e., the growth rate, peaks. (C) 2014 AIP Publishing LLC.
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Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Southwestern Inst Phys, Chengdu 610041, Sichuan, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Ren, Guangzhi
Wei, Lai
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Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Wei, Lai
Li, Jiquan
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Southwestern Inst Phys, Chengdu 610041, Sichuan, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
Li, Jiquan
Wang, Zheng-Xiong
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Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R ChinaDalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China