1/f noise in the tunneling current of thin gate oxides

被引:8
作者
Alers, GB
Monroe, D
Krisch, KS
Weir, BE
Chang, AM
机构
来源
MATERIALS RELIABILITY IN MICROELECTRONICS VI | 1996年 / 428卷
关键词
D O I
10.1557/PROC-428-311
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have observed fluctuations in the tunneling current through 3.5 nm gate oxides with a 1/f power spectrum where f is the frequency. For voltages in the direct tunneling regime we find an anomalous current dependence of the noise relative to previous observations of noise in thin oxides. We present a simplified model for the current noise in terms of fluctuations in a trap assisted tunneling current that exists in the oxide in addition to the direct tunneling current. Current noise appears to be a very sensitive probe of trap assisted tunneling and degradation in oxides.
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页码:311 / 315
页数:5
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