Ultra-low-power and stable 10-nm FinFET 10T sub-threshold SRAM

被引:32
作者
Abbasian, Erfan [1 ]
Birla, Shilpi [2 ]
Gholipour, Morteza [1 ]
机构
[1] Babol Noshirvani Univ Technol, Fac Elect & Comp Engn, Babol 4714871167, Iran
[2] Manipal Univ Jaipur, Dept Elect & Commun Engn, Jaipur, Rajasthan, India
来源
MICROELECTRONICS JOURNAL | 2022年 / 123卷
关键词
SRAM; FinFET; Ultra-low-power; Stability; Sub-threshold; Process variations; CELL; DESIGN; ROBUST;
D O I
10.1016/j.mejo.2022.105427
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper explores an ultra-low-power 10T subthreshold SRAM with high stabilities based on 10-nm FinFETs. To prove the superiority of the proposed 10T SRAM's performance, a comparison has been done with existing SRAMs such as the 6T, ST2, DIRP10T, PPN10T, and FC11T at V-DD = 0.3 V. The proposed cell offers 2.08X/1.31X/ 1.03X higher read-stability compared to 6T/ST2/PPN10T due to the use of the read decoupling technique. Writability is increased at least 1.28X by temporarily floating the data node. In the proposed single-ended design, readbitline does not need to be precharged to V(DD )to execute read operation, therefore, improving dynamic read power by at least 2.69X. Because of its single-ended nature, the suggested 10T SRAM's dynamic write power consumption is lowered by at least 1.86X. The stacked structure used in the cell core and bitline leakage removed in the read path minimize leakage power by at least 1.50X. Therefore, the proposed design can be an appropriate choice for ultra-low-power applications.
引用
收藏
页数:10
相关论文
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