Icosahedral Al62Cu25.5Fe12.5 phase in the presence of carbon

被引:3
作者
Bonasso, N
Rouxel, D
Pigeat, P
机构
[1] Ecole Mines, CNRS, UMR 7570, Lab Sci & Genie Surfaces, F-54042 Nancy, France
[2] Univ Technol Belfort Montbeliard, UPRES, EA 3316, Lab Etudes & Rech Mat Procedes & Surfaces, F-90010 Belfort, France
[3] UHP Nancy 1, Fac Sci, CNRS, UMR 7040,Lab Phys Milieux Ionises & Applicat, F-54046 Vandoeuvre Les Nancy, France
来源
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2005年 / 390卷 / 1-2期
关键词
thin film; quasicrystal; carbon; diffusion;
D O I
10.1016/j.msea.2004.08.017
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Previous studies have suggested that contamination by carbon of the i-Al62Cu25.5Fe12.5 quasicrystalline phase can cause destabilization of the aperiodic structure. Hence, the possibility of carbon diffusion into AlCuFe quasicrystalline thin films and the possible subsequent degradation of the quasicrystalline structure were investigated at room temperature through to 600degreesC. The study shows that a carbon layer deposited on the AlCuFe quasicrystalline thin film did not diffuse into the AlCuFe over the temperature range tested whatever the oxide thickness between carbon and alloy. Moreover, the carbon did not react with any of the alloy elements as has been shown with aluminium, in the presence of oxygen. Post-deposition annealing at 600degreesC of the amorphous alloy, fabricated by simultaneous electron beam evaporation on an amorphous carbon substrate used for transmission electron microscopy (TEM), also leads to a pure quasicrystalline phase thin film without any carbon diffusion from the substrate. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:166 / 170
页数:5
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