Effect of quantum well non-uniformities on lasing threshold, linewidth, and lateral near field filamentation in violet (Al, In)GaN laser diodes

被引:11
作者
Jeschke, J. [1 ]
Zeimer, U. [1 ]
Redaelli, L. [1 ]
Einfeldt, S. [1 ]
Kneissl, M. [1 ,2 ]
Weyers, M. [1 ]
机构
[1] Leibniz Inst Hoechstfrequenztech, Ferdinand Braun Inst, D-12489 Berlin, Germany
[2] Tech Univ Berlin, Inst Solid State Phys, D-10623 Belin, Germany
关键词
SEMICONDUCTOR-LASERS; OPERATION; TIME; LEDS;
D O I
10.1063/1.4899298
中图分类号
O59 [应用物理学];
学科分类号
摘要
The lateral near field patterns and filamentation effects of gain guided broad area (Al, In) GaN-based laser diodes emitting around 415 nm have been investigated. Diodes from the same laser bar, which are close to each other, show nearly the same number and widths of filaments. Comparison of different bars, which are from the same wafer but further apart from each other, reveals that a higher number of filaments correlates with a higher laser threshold and broader spectral linewidth. Cathodoluminescence mappings at 80K show strong variations of the quantum well band gap and hence of the emission wavelength for the bars with strong filamentation. These observations confirm previous theoretical predictions stating that large band gap fluctuations increase the threshold current and spectral linewidth. Furthermore, filamentation is enhanced as well because of a reduction of the carrier diffusion length. (C) 2014 AIP Publishing LLC.
引用
收藏
页数:3
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