Electrohydrodynamic direct-writing lithography: An alternative maskless technique for microstructure fabrication

被引：29

作者：

He, Jiankang ^{[1
]}

Xu, Fangyuan ^{[1
]}

Cao, Yi ^{[1
]}

Liu, Yaxiong ^{[1
]}

Li, Dichen ^{[1
]}

Jin, Zhongmin ^{[1
]}

机构：

[1] Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian 710049, Peoples R China

来源：

APPLIED PHYSICS LETTERS | 2014年 / 105卷 / 25期

基金：

中国国家自然科学基金;

关键词：

HIGH-RESOLUTION; SILK; NANOFIBERS;

D O I：

10.1063/1.4905151

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A maskless electrohydrodynamic direct-writing lithographic strategy was presented to flexibly fabricate user-specific micropatterns on silicon substrates. By optimizing the operating parameters, parallel lines as well as lattices with line width of about 2 mu m could be stably deposited. The printed micropatterns were found to function as sacrificial template to transfer microstructures into silicon substrates and the etching processes had little effect on the predefined size. It is envisioned that this simple approach provides an alternative to the existing microfabrication techniques, which might enable the wide accessibility of microscale technologies to advance various research fields such as microfluidics, biomedical chips, and microscale tissue engineering. (C) 2014 AIP Publishing LLC.

引用

页数：4

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