Characterization of ZnO thin film synthesized on alumina-rich spinel substrate by magnetron sputtering

被引：4
作者：
Tang, Huili [1 ,2 ]
Xu, Jun [1 ]
Li, Hongjun [1 ,3 ]
Dong, Yongjun [3 ]
Wang, Yinzhen [4 ]
Wu, Feng [3 ]
机构：
[1] Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 201800, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 100049, Peoples R China
[3] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
[4] S China Normal Univ, Sch Phys & Telecommun Engn, Guangzhou 510631, Guangdong, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 2010年 / 256卷 / 16期
关键词：
ZnO thin film; Semiconductor compounds; Magnetron sputtering; OPTICAL-PROPERTIES; GROWTH;
D O I：
10.1016/j.apsusc.2010.03.005
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Zinc oxide (ZnO) thin film has been epitaxially grown on (1 1 1) Mg0.4Al2.4O4 substrate by RF-magnetron sputtering. In resonant Raman scattering, higher-order longitudinal optical phonon modes were clearly observed, revealing high optical quality of the ZnO film. Optical absorption indicated a visible exciton absorption at room temperature. The near band edge emission showed a red shift due to the shrinkage of the band gap with increasing the temperature. Crown (C) 2010 Published by Elsevier B. V. All rights reserved.
引用
收藏
页码：4934 / 4937
页数：4
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