Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

被引:2
作者
Sanekata, Masaomi [1 ]
Nishida, Hiroshi [1 ]
Nakagomi, Yuki [1 ]
Hirai, Yoshihiro [1 ,2 ]
Nishimiya, Nobuo [1 ]
Tona, Masahide [2 ]
Hirata, Naoyuki [2 ]
Yamamoto, Hiroaki [2 ]
Tsukamoto, Keizo [2 ]
Ohshimo, Keijiro [3 ]
Misaizu, Fuminori [3 ]
Fuke, Kiyokazu [4 ]
机构
[1] Tokyo Polytech Univ, Fac Engn, Atsugi, Kanagawa 2430297, Japan
[2] Ayabo Corp, Anjo, Aichi 4460052, Japan
[3] Tohoku Univ, Grad Sch Sci, Dept Chem, Sendai 9808578, Japan
[4] Toyota Phys & Chem Res Inst, Nagakute, Aichi 4801192, Japan
基金
日本学术振兴会;
关键词
magnetron sputtering; HPPMS; MPPMS; DOMS; optical emission spectroscopy; delayed discharge; plasma diagnostics; DEPOSITION; COATINGS; HIPIMS; PLASMA; ENHANCEMENT; DC;
D O I
10.3390/plasma4020018
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Modulated pulsed power magnetron sputtering (MPPMS) of titanium was investigated as a function of argon gas pressure using optical emission spectroscopy (OES). Delays in discharge and the formation of comb-like discharge current waveforms due to splitting and pulsing were observed with a decrease in pressure. This observation corresponds to the evolution from MPPMS condition to deep-oscillation-magnetron-sputtering (DOMS)-like condition by changing discharge gas pressure. The optical emission intensities of the ionic species (Ar+ and Ti+) increased as the comb-like current waveforms were formed with decreasing Ar pressure. This behavior showed a marked contrast to that of the neutral species (Ar and Ti). The Ar pressure dependence of OES was revealed to be due to the plasma build-up stage, which is the initial generation process of plasma discharge in pulsed dc magnetron sputtering, from the temporal profile for the atomic-line intensities of the optically emitting species in MPPMS and DOMS-like plasmas.
引用
收藏
页码:269 / 280
页数:12
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