Application of kinoform lens for X-ray reflectivity analysis

被引:12
作者
Tiwari, M. K. [1 ]
Alianelli, L. [1 ]
Dolbnya, I. P. [1 ]
Sawhney, K. J. S. [1 ]
机构
[1] Diamond Light Source Ltd, Didcot OX11 0DE, Oxon, England
关键词
kinoform lens; X-ray reflectivity; thin multilayer structures; synchrotron radiation source; SPATIAL-RESOLUTION; MULTILAYERS; MICROSCOPY;
D O I
10.1107/S0909049509055009
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
In this paper the first practical application of kinoform lenses for the X-ray reflectivity characterization of thin layered materials is demonstrated. The focused X-ray beam generated from a kinoform lens, a line of nominal size similar to 50 mu m x 2 mu m, provides a unique possibility to measure the X-ray reflectivities of thin layered materials in sample scanning mode. Moreover, the small footprint of the X-ray beam, generated on the sample surface at grazing incidence angles, enables one to measure the absolute X-ray reflectivities. This approach has been tested by analyzing a few thin multilayer structures. The advantages achieved over the conventional X-ray reflectivity technique are discussed and demonstrated by measurements.
引用
收藏
页码:237 / 242
页数:6
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