共 11 条
[2]
Combining microstereolithography and thick resist UV lithography for 3D microfabrication
[J].
MICRO ELECTRO MECHANICAL SYSTEMS - IEEE ELEVENTH ANNUAL INTERNATIONAL WORKSHOP PROCEEDINGS,
1998,
:18-23
[3]
BOYSEL RM, 1992, P SOC PHOTO-OPT INS, V1793, P34
[4]
Profile control of SU-8 photoresist using different radiation sources
[J].
MEMS DESIGN, FABRICATION, CHARACTERIZATION, AND PACKAGING,
2001, 4407
:119-125
[5]
LABIANCA N, 1995, P SOC PHOTO-OPT INS, V2438, P846, DOI 10.1117/12.210413
[6]
Micromachining applications of a high resolution ultrathick photoresist
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1995, 13 (06)
:3012-3016
[7]
Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters
[J].
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2,
2000, 3999
:1019-1027