Semiconductor hollow optical waveguides formed by omni-directional reflectors

被引：61
作者：
Lo, SS [1 ]
Wang, MS [1 ]
Chen, CC [1 ]
机构：
[1] Natl Cent Univ, Inst Opt Sci, Jhong Li 320, Taiwan
来源：
OPTICS EXPRESS | 2004年 / 12卷 / 26期
关键词：
D O I：
10.1364/OPEX.12.006589
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
In this study, a hollow optical waveguide with omni-directional reflectors in silicon-based materials was design, fabricated and characterized. By using dry etching technique, plasma-enhanced chemical vapor deposition for Si/SiO2 thin films and covering another wafer with omni-directional reflector together, the waveguides can be formed with an air core of 1.2 mum x 1.3 mum. A uniform propagation loss of the waveguide to be around 1.7dB/cm for C+L band was found for the TE and TM modes. Polarization-independent hollow optical waveguides were obtained with the hollow waveguide structure. (C) 2004 Optical Society of America.
引用
收藏
页码：6589 / 6593
页数：5
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