Investigation of sheath properties in Ar/SF6 dc discharge plasma

被引:29
作者
Boruah, D [1 ]
Pal, AR [1 ]
Bailung, H [1 ]
Chutia, J [1 ]
机构
[1] Inst Adv Study Sci & Technol, Div Plasma Phys, Khanapara 781022, Assam, India
关键词
D O I
10.1088/0022-3727/36/6/306
中图分类号
O59 [应用物理学];
学科分类号
摘要
Properties of plasma sheath boundary in multicomponent plasma with negative ions have been investigated experimentally. The modified Bohm sheath criterion derived for thermal electron-thermal negative ion-cold positive ion model predicts the decrease of positive ion drift speed toward the sheath when the negative ion concentration is gradually increased. This modified Bohm criterion has been discussed in this experimental investigation. The experimental parameters (e.g. discharge voltage, discharge current) set for argon plasma production are kept floating during the addition of SF6 gas. Two important effects caused by the presence of negative ions, e.g. decrease in Bohm speed of positive ions toward the sheath and reduction in plasma density have been observed. The reduction in the ion flux toward the sheath therefore causes the expansion of the sheath. The numerical solution of Poisson's equation, which includes the contribution of negative ions, is compared with the experimental findings.
引用
收藏
页码:645 / 652
页数:8
相关论文
共 26 条
[11]   The effect of including the ion flux issuing from the core of an electronegative plasma on the electron temperature versus pressure characteristic [J].
Franklin, RN .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (03) :279-282
[12]   A critique of models of electronegative plasmas [J].
Franklin, RN .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2001, 10 (02) :162-167
[13]   The transition from collisionless to collisional active plasma in the fluid model and the relevance of the Bohm criterion to sheath formation [J].
Franklin, RN ;
Snell, J .
PHYSICS OF PLASMAS, 2000, 7 (07) :3077-3083
[14]   Observations of low-frequency mode in a multicomponent plasma with negative ions [J].
Handique, B ;
Bailung, H ;
Das, GC ;
Chutia, J .
PHYSICS OF PLASMAS, 1999, 6 (05) :1636-1640
[15]   Space charge layers in a double plasma machine [J].
Hassall, G ;
Allen, JE .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1997, 30 (03) :381-399
[16]   PLASMA POTENTIAL MEASUREMENTS BY ELECTRON EMISSIVE PROBES [J].
KEMP, RF ;
SELLEN, JM .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1966, 37 (04) :455-&
[17]   Formation of an oscillatory potential structure at the plasma boundary in electronegative plasmas [J].
Kono, A .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1999, 32 (12) :1357-1363
[18]  
LIEBERMAN MA, 1994, PRINCIPLES PLASMA DI
[19]  
NAKAMURA Y, 1981, J APPL PHYS, V52, P1179
[20]   Ion dynamics in the sheath in multicomponent plasma with negative ions [J].
Prakash, R ;
Sarma, A ;
Chutia, J .
REVIEW OF SCIENTIFIC INSTRUMENTS, 2000, 71 (07) :2733-2736