Highly textured TiN ceramic prepared by edge-free spark plasma sintering

被引:1
作者
Wang, Shengkai [1 ,2 ]
Ge, Bangzhi [2 ]
Hu, Jiabin [2 ]
Xie, Wenqi [2 ]
Liu, Yi [3 ]
Xu, Shunjian [1 ]
Shi, Zhongqi [2 ]
机构
[1] Xinyu Univ, Sch Mech & Elect Engn, 2666,Sunshine Ave, Xinyu 338000, Peoples R China
[2] Xi An Jiao Tong Univ, State Key Lab Mech Behav Mat, 28,XianningWest Rd, Xian 710049, Peoples R China
[3] Shaanxi Univ Sci Technol, Sch Mat Sci & Engn, Xian, Peoples R China
基金
中国国家自然科学基金;
关键词
Nitrides; spark plasma sintering; electron backscattering diffraction (EBSD); X-ray diffraction (XRD); textured microstructure; orientation factor; mechanical properties; physical properties; PREFERRED ORIENTATION; MECHANICAL-PROPERTIES; ELECTRICAL-PROPERTIES; THERMAL-STABILITY; MICROSTRUCTURE; TI2ALN; CARBIDES; FRACTURE; TI3ALC2;
D O I
10.1080/02670836.2022.2069213
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Highly textured TiN ceramic was successfully prepared by edge-free spark plasma sintering (EFSPS) method at 1600 degrees C using anisotropic Ti2AlN cylinder as preform. The phase and crystalline evolutions from anisotropic Ti2AlN to textured bulk TiN were revealed via changing the EFSPS temperature. The orientation degree of the as-fabricated TiN ceramic was evaluated by X-ray diffraction and electron backscattered diffraction. It was found that the lll planes of TiN grains were perpendicular to the SPS-loading direction and the Lotgering orientation factor on the top surface of bulk TiN was as high as f((lll) )= 0.88. Because of the highly textured microstructure, the obtained TiN ceramic exhibited anisotropic mechanical and physical properties.
引用
收藏
页码:1029 / 1036
页数:8
相关论文
共 32 条
[1]   Stress and preferred orientation in nitride-based PVD coatings [J].
Abadias, G. .
SURFACE & COATINGS TECHNOLOGY, 2008, 202 (11) :2223-2235
[2]   Physical-mechanical properties of nanostructured titanium nitride [J].
Andrievski, RA .
NANOSTRUCTURED MATERIALS, 1997, 9 (1-8) :607-610
[3]  
caltech, CANADIAN METALLURGIC
[4]   Annealing effect on microstructure and mechanical properties of magnetron sputtering Ti-Si-C thin film [J].
Chen, Z. S. ;
Li, H. J. ;
Fu, Q. G. ;
Yang, D. ;
Shen, Q. L. .
MATERIALS SCIENCE AND TECHNOLOGY, 2013, 29 (08) :975-979
[5]   Thermal stability of Ti3SiC2 thin films [J].
Emmerlich, Jens ;
Music, Denis ;
Eklund, Per ;
Wilhelmsson, Ola ;
Jansson, Ulf ;
Schneider, Jochen M. ;
Hogberg, Hans ;
Hultman, Lars .
ACTA MATERIALIA, 2007, 55 (04) :1479-1488
[6]   Microstructure and Preferred Orientation of Titanium Nitride Films Prepared by Laser CVD [J].
Gong, Yansheng ;
Tu, Rong ;
Goto, Takashi .
MATERIALS TRANSACTIONS, 2009, 50 (08) :2028-2034
[7]  
Green DJ., 1998, An introduction to the mechanical properties of ceramics
[8]   Spark plasma sintering of nano-sized TiN prepared from TiO2 by controlled hydrolysis of TiCl4 and Ti(O-i-C3H7)4 solution [J].
Kawano, S ;
Takahashi, J ;
Shimada, S .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2003, 86 (09) :1609-1611
[9]  
KOBAYASHI M, 1978, THIN SOLID FILMS, V54, P67, DOI 10.1016/0040-6090(78)90278-X
[10]   Thickness dependent microstructural and electrical properties of TiN thin films prepared by DC reactive magnetron sputtering [J].
Liang, Hailong ;
Xu, Jin ;
Zhou, Dayu ;
Sun, Xu ;
Chu, Shichao ;
Bai, Yizhen .
CERAMICS INTERNATIONAL, 2016, 42 (02) :2642-2647