Pore etching in III-V and II-VI semiconductor compounds in neutral electrolyte

被引:45
作者
Tiginyanu, I. M. [1 ]
Ursaki, V. V.
Monaico, E.
Foca, E.
Foell, H.
机构
[1] Moldavian Acad Sci, Inst Appl Phys, Lab Low Dimens Semicond Structures, MD-2028 Kishinev, Moldova
[2] Tech Univ Moldova, Natl Ctr Mat Study & Testing, MD-2004 Kishinev, Moldova
[3] Univ Kiel, Fac Engn, Chair Gen Mat Sci, D-24143 Kiel, Germany
关键词
D O I
10.1149/1.2771076
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
propose to use a neutral electrolyte based on an aqueous solution of NaCl instead of commonly used aggressive acids or alkaline electrolytes for the purpose of electrochemical nanostructuring of GaAs and CdSe substrates. It is shown that the process of material porosification can be controlled by the conditions of anodic etching. A photoluminescence analysis of the porous structures obtained and referenced to the as-grown substrate demonstrates that an effective passivation of the surface occurs during anodization in this electrolyte. The results obtained pave the way for the development of optoelectronic devices based on electrochemically nanostructured GaAs and CdSe compounds, particularly for high-efficiency solar cells. (c) 2007 The Electrochemical Society.
引用
收藏
页码:D127 / D129
页数:3
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