Growth conditions in molecular beam epitaxy for controlling CdSeTe epilayer composition

被引:18
|
作者
Matsumura, N [1 ]
Sakamoto, T [1 ]
Saraie, J [1 ]
机构
[1] Kyoto Inst Technol, Fac Engn & Design, Dept Elect & Informat Sci, Matsugasaki, Kyoto 6068585, Japan
关键词
growth models; molecular beam epitaxy; alloys; cadmium compounds; semiconducting cadmium compounds;
D O I
10.1016/S0022-0248(02)02434-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We studied the growth conditions for controlling CdSeTe epilayer composition. Te atoms are readily incorporated into CdSeTe epilayers. However, we could not control the Te composition by the beam intensity ratio of Te to Cd. Therefore, Te atoms are not preferentially chemisorbed on Cd atoms. Both the difference in the desorption rate of the physisorbed atoms and the difference in the formation energies of CdSe and CdTe affect the composition. The epilayers composition could be well controlled in the entire range by the beam intensity ratio of J(Se)/(J(Se) + J(Te)) when the epilayers were grown on the U-stabilized surface. A simple growth model is presented and the sticking probabilities of Se and Te were determined from the growth rate to be 0.1 and 1, respectively. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:602 / 606
页数:5
相关论文
共 50 条
  • [1] Composition control of CdSeTe layers grown by molecular beam epitaxy
    Matsumura, N
    Sakamoto, T
    Saraie, J
    JOURNAL OF CRYSTAL GROWTH, 2002, 237 : 1550 - 1553
  • [2] Modelling of InGaP nanowires morphology and composition on molecular beam epitaxy growth conditions
    Fakhr, A.
    Haddara, Y. M.
    JOURNAL OF APPLIED PHYSICS, 2014, 116 (02)
  • [3] Molecular Beam Epitaxy Growth and Characterization of AlGaN Epilayer in the Nitrogenrich Condition on Si Substrate
    Zhang, Qihua
    Yin, Xue
    Zhao, Songrui
    2021 PHOTONICS NORTH (PN), 2021,
  • [4] Growth and characterization of GaN epilayer on sapphire substrate by ammonia gas source molecular beam epitaxy
    Kurai, S
    Kudo, S
    Okazaki, T
    Taguchi, T
    Rosamond, M
    van Hove, J
    Chow, P
    PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, 2000, 1 : 213 - 216
  • [5] Morphological defects of molecular beam epitaxy-grown CdTe and CdSeTe on Si
    Campo, EM
    Hierl, T
    Hwang, JCM
    Chen, YP
    Brill, G
    JOURNAL OF ELECTRONIC MATERIALS, 2005, 34 (06) : 953 - 956
  • [6] Morphological defects of molecular beam epitaxy-grown CdTe and CdSeTe on Si
    Eva M. Campo
    Thomas Hierl
    James C. M. Hwang
    Yuanping Chen
    Gregory Brill
    Journal of Electronic Materials, 2005, 34 : 953 - 956
  • [7] Comparison of cathodoluminescence and photoluminescence of CdSeTe films grown on Si by molecular beam epitaxy
    Campo, EM
    Hierl, T
    Hwang, JCM
    Chen, YP
    Brill, G
    Dhar, NK
    INFRARED DETECTOR MATERIALS AND DEVICES, 2004, 5564 : 86 - 91
  • [8] Molecular beam epitaxy growth and pole figure analysis of ZnTe epilayer on m-plane sapphire
    Nakasu, Taizo
    Kobayashi, Masakazu
    Asahi, Toshiaki
    Togo, Hiroyoshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2014, 53 (01)
  • [9] ON EPILAYER TILT IN ZNSE/GE HETEROSTRUCTURES PREPARED BY MOLECULAR-BEAM EPITAXY
    KLEIMAN, J
    PARK, RM
    MAR, HA
    JOURNAL OF APPLIED PHYSICS, 1988, 64 (03) : 1201 - 1205
  • [10] Evaluation of nanoindentation characteristics of cubic InN epilayer grown by Molecular Beam Epitaxy
    Hernandez, S. A. Garcia
    Garcia, V. D. Compean
    Navarrete, E. Prado
    Luna, E. Lopez
    Vidal, M. A.
    THIN SOLID FILMS, 2021, 736 (736)