Metal-oxide-semiconductor field effect transistor-control led field emission display

被引:1
作者
Kim, IH [1 ]
Lee, JD [1 ]
Oh, CW [1 ]
Park, JW [1 ]
Park, BG [1 ]
机构
[1] Samsung SDI Co Ltd, Paldal Gu, Kyungki 422391, South Korea
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 01期
关键词
D O I
10.1116/1.1524134
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A metal-oxide-semiconductor field effect transistor-controlled field emission display (MCFED) was fabricated to evaluate the validity of MCFEAs (MOSFET-controlled field emitter arrays) for display application. The electrical properties of FEAs, HVMOSFETs (high voltage MOSFETs), and MCFEAs were measured. The gate hole diameter of a fabricated FEA is 1.25 mum and the extraction gate voltage to obtain the anode current of 10 nA/tip is 71 V. The threshold voltage and the breakdown voltage of a HVMOSFET are 1.4 and 81 V, respectively. The I-V characteristics of a MCFEA show that the emission currents of FEA are well controlled by the control gate voltage of the HVMOSFET. To exclude the harmful effects generated during the packaging process, the performance of the MCFED was evaluated in a high vacuum chamber. It was proven that the uniformity of a conventional FED could be improved by the integration with a MOSFET. (C) 2003 American Vacuum Society.
引用
收藏
页码:519 / 522
页数:4
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