Reflectivity experiments with 60 femtosecond laser pulses

被引:8
作者
Riley, D [1 ]
Langley, AJ
Taday, PF
Shaikh, W
McCormack, I
机构
[1] Queens Univ Belfast, Sch Math & Phys, Belfast BT7 1NN, Antrim, North Ireland
[2] Rutherford Appleton Lab, Cent Laser Facil, Didcot OX11 0QX, Oxon, England
关键词
D O I
10.1088/0022-3727/31/5/008
中图分类号
O59 [应用物理学];
学科分类号
摘要
The reflectivity of solid silicon and aluminium targets has been measured at a fixed angle of incidence as a function of focused intensity for 60 fs pulses of 750 nm laser tight. It was found that, even for intensities in excess of 10(15) W cm(-2) there was no observable change in reflectivity from the low intensity value. This is taken to indicate that there is no formation of a high density gaseous plasma during the laser pulse. However, examination of the silicon target shows significant damage spots that indicate that melting and possibly gaseous plasma formation do occur after the pulse.
引用
收藏
页码:515 / 518
页数:4
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