Effect of substrate-tilting angle-dependent grain growth and columnar growth in ZnO film deposited using radio frequency (RF) magnetron sputtering method

被引：8

作者：

Sonklin, Thita ^{[1
]}

Munthala, Dhanunjaya ^{[1
]}

Leuasoongnoen, Pimchanok ^{[2
]}

Janphuang, Pattanapong ^{[2
]}

Pojprapai, Soodkhet ^{[1
]}

机构：

[1] Suranaree Univ Technol, Sch Ceram Engn, 111 Univ Ave, Muang 30000, Nakhon Ratchasi, Thailand

[2] Synchrotron Light Res Inst Publ Org, 111 Univ Ave, Muang Dist 30000, Nakhon Ratchasi, Thailand

来源：

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS | 2022年 / 33卷 / 21期

关键词：

Crystallinity - Film growth - Grain growth - II-VI semiconductors - Magnetron sputtering - Metallic films - Morphology - Optical properties - Oxide films - Radio waves - Scanning electron microscopy - Surface roughness - Zinc oxide;

D O I：

10.1007/s10854-022-08576-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The present work reports the result of substrate-tilt angle-dependent deposition of Zinc Oxide (ZnO) films using Radio Frequency (RF) magnetron sputtering method. The substrate angle and deposition rate played an important role in the formation of columnar growth direction and grain growth. The ZnO film surface roughness, morphology, crystallinity, and optical properties were studied using Field Emission Scanning Electron Microscope (FE-SEM), Atomic Force Microscopy (AFM), X-ray Diffraction Spectroscopy (XRD), and Ultraviolet-Visible Spectroscopy (Uv-Vis), respectively. The present study reveals that the glancing angle deposition is of paramount importance, which leads to the different growth orientations on ZnO film. This knowledge can apply to ZnO film fabrication to improve the film quality.

引用

页码：16977 / 16986

页数：10

共 43 条

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