Refractory Plasmonics with Titanium Nitride: Broadband Metamaterial Absorber

被引：693

作者：

Li, Wei ^{[1
,2
]}

Guler, Urcan ^{[1
,2
]}

Kinsey, Nathaniel ^{[1
,2
]}

Naik, Gururaj V. ^{[1
,2
]}

Boltasseva, Alexandra ^{[1
,2
,4
]}

Guan, Jianguo ^{[3
]}

Shalaev, Vladimir M. ^{[1
,2
]}

Kildishev, Alexander V. ^{[1
,2
]}

机构：

[1] Purdue Univ, Sch Elect & Comp Engn, W Lafayette, IN 47907 USA

[2] Purdue Univ, Birck Nanotechnol Ctr, W Lafayette, IN 47907 USA

[3] Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China

[4] Tech Univ Denmark, Dept Photon Engn, DTU Foton, DK-2800 Lyngby, Denmark

来源：

ADVANCED MATERIALS | 2014年 / 26卷 / 47期

基金：

中国博士后科学基金; 中国国家自然科学基金;

关键词：

ABSORPTION; LIGHT; DESIGN; GOLD; EMITTERS;

D O I：

10.1002/adma.201401874

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A high-temperature stable broadband plasmonic absorber is designed, fabricated, and optically characterized. A broadband absorber with an average high absorption of 95% and a total thickness of 240 nm is fabricated, using a refractory plasmonic material, titanium nitride. This absorber integrates both the plasmonic resonances and the dielectric-like loss. It opens a path for the interesting applications such as solar thermophotovoltaics and optical circuits.

引用

页码：7959 / +

页数：8

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