The dislocation origin and model of excess tunnel current in GaP p-n structures

被引:32
作者
Evstropov, VV
Dzhumaeva, M
Zhilyaev, YV
Nazarov, N
Sitnikova, AA
Fedorov, LM
机构
[1] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
[2] Acad Sci Turkmenistan, Inst Physicotech, Ashkhabad 744000, Turkmenistan
关键词
Microscopy; Electron Microscopy; Transmission Electron Microscopy; Magnetic Material; Potential Barrier;
D O I
10.1134/1.1325428
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
An excess tunnel current in GaP epitaxial nondegenerate p-n junctions on GaP and Si substrates was studied. An important experimental result is that the slope of exponential current-voltage (I-V) characteristic (in lnI-V coordinates) is independent of the width of the space-charge region, i.e., on n- and p-region doping levels. This fact is unexplained by existing models. A dislocation shunt model based on multihop tunneling through a dislocation line, which may be considered as a chain of parabolic potential barriers, is proposed. The density of dislocations predicted by this model is in agreement with the transmission electron microscopy (TEM) observations. (C) 2000 MAIK "Nauka /Interperiodica".
引用
收藏
页码:1305 / 1310
页数:6
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