Growth of epitaxial Fe0.5Ni0.5 thin films and their magnetic properties

被引：2

作者：

Swain, Mitali ^{[1
]}

Kong, Hyeonjun ^{[1
]}

Lee, Joonhyuk ^{[1
]}

Park, Sungkyun ^{[1
]}

Jeen, Hyoungjeen ^{[1
]}

机构：

[1] Pusan Natl Univ, Dept Phys, Busan 46241, South Korea

来源：

MATERIALS RESEARCH EXPRESS | 2018年 / 5卷 / 11期

基金：

新加坡国家研究基金会;

关键词：

FeNi alloy; thin film; anisotropy; microstructure; MEMS; SENSORS;

D O I：

10.1088/2053-1591/aade2e

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Growth conditions for the epitaxial Fe0.5Ni0.5 (FeNi) thin films were optimized in order to enhance crystallinity and magnetism. Epitaxial thin films of FeNi (111) were successfully grown on (0001) Al2O3 substrates at substrate temperature of 400 degrees C. In addition, thickness dependence on structural and magnetic behavior of epitaxial FeNi thin films has been investigated using x-ray diffraction, x-ray reflectometry and vibrating sample magnetometer. The change in magnetization and coercivity are explained as a result of various anisotropic effects (stress, magneto-crystalline and shape anisotropies) as well as domain size in the FeNi film with a thickness range 195 angstrom to 703 angstrom. It is observed that, the magnetism is strongly dependent upon the microstructure and the thickness of the magnetic layer.

引用

页数：6

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