Phase Changes of 4H-SiC in Excimer Laser Doping

被引:1
作者
Usami, Yasutsugu [1 ,2 ]
Imokawa, Kaname [2 ]
Nohdomi, Ryoichi [2 ]
Sunahara, Atsushi [3 ]
Mizoguchi, Hakaru [2 ]
机构
[1] Kyushu Univ, Acad Res & Ind Collaborat Management Off, Nishi Ku, 744 Motooka, Fukuoka, Japan
[2] Gigaphoton Inc, Res Div, 400 Yokokurashinden, Oyama, Tochigi, Japan
[3] Purdue Univ, 610 Purdue Mall, W Lafayette, IN 47907 USA
关键词
4H-SiC; excimer laser; doping; phase change; Raman; DIFFUSION; ABLATION; STRESS;
D O I
10.1007/s11664-022-09625-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
To understand the mechanism of laser doping by a KrF excimer laser, we have experimentally evaluated the structural changes of 4H-SiC in the doping-capable region (the region where ablation does not occur and the temperature does not exceed the peritectic temperature). In the previous report, the calculation result assuming that the crystal state of SiC may change due to laser irradiation even in the doping-capable region was reported. In this study, it is experimentally confirmed that the phase change of 4H-SiC depends on the volume density of the total number of photons by laser irradiation even before ablation conditions. As a result, it was found that the model of the phase change of 4H-SiC in excimer laser doping can be considered as the synthesis of state change by photomechanical reaction in addition to photothermal and photochemical reactions.
引用
收藏
页码:3766 / 3772
页数:7
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