The role of MEMS in maskless lithography

被引：24

作者：

Kruit, P. ^{[1
]}

机构：

[1] Delft Univ Technol, NL-2628 CJ Delft, Netherlands

来源：

MICROELECTRONIC ENGINEERING | 2007年 / 84卷 / 5-8期

关键词：

maskless lithography; multibeam lithography; electron beam lithography; MEMS; lithography masks; semiconductor processing;

D O I：

10.1016/j.mee.2007.01.082

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The challenges for maskless lithography at several wafers per hour at the 45-32 nm lithography node are analyzed. The conclusion is that such speed is only obtainable with systems based on massive parallelism, whether the principle is based on light optics, electron optics or atomic force microscopes. The construction of such systems demands the use of micro-electro-mechanical systems (MEMS). Different concepts employing MEMS are reviewed. Typical requirements for the manufacturing of the MEMS components are analyzed for a multi-column electron beam concept such as the MAPPER system. Examples of successfully fabricated array structures are shown. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：1027 / 1032

页数：6

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