Static dielectric constant of Al nanocrystal/Al2O3 nanocomposite thin films determined by the capacitance-voltage reconstruction technique

被引:6
作者
Liu, Z. [1 ]
Chen, T. P. [1 ]
Liu, Y. [1 ,2 ]
Yang, M. [1 ]
Wong, J. I. [1 ]
Cen, Z. H. [1 ]
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
[2] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
基金
新加坡国家研究基金会; 美国国家科学基金会;
关键词
aluminium; aluminium compounds; dangling bonds; dielectric thin films; electrical conductivity; nanocomposites; permittivity; sputter deposition; ELECTRICAL-PROPERTIES; AMORPHOUS AL2O3; DOPED ALUMINA; SILICON;
D O I
10.1063/1.3425714
中图分类号
O59 [应用物理学];
学科分类号
摘要
Al nanocrystal (nc-Al)/Al2O3 nanocomposite thin films were synthesized by radio-frequency magnetron sputtering. The static dielectric constant (epsilon(r)) of the nanocomposite thin films was determined by the capacitance-voltage reconstruction technique which was able to correct for the influence of high current conduction in the thin films. In contrast to pure Al2O3, the nanocomposite has a much higher epsilon(r) and its epsilon(r) exhibits strong temperature dependence also. The higher epsilon(r) is attributed to the dipole effect of the Al-O dangling bonds due to the presence of nc-Al in the Al2O3 matrix. However, the dipole effect degrades at a higher temperature, which explains the observed decrease in epsilon(r) with increasing temperature.
引用
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页数:3
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