Effect of growth temperature on polytype transition of GaN from zincblende to wurtzite

被引:33
作者
Suandon, Siripen
Sanorpim, Sakuntam
Yoodee, Kajornyod
Onabe, Kentaro
机构
[1] Chulalongkorn Univ, Dept Phys, Fac Sci, Bangkok 10330, Thailand
[2] Univ Tokyo, Dept Adv Mat Sci, Grad Sch Frontier Sci, Kashiwa, Chiba 2778561, Japan
关键词
GaN; transmission electron microscopy; growth temperature; polytype transition; metalorganic vapor phase epitaxy;
D O I
10.1016/j.tsf.2006.07.109
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have investigated effect of growth temperature on the polytype conversion of cubic GaN (c-GaN) grown on GaAs (001) substrates by MOVPE. It was found that the polytype transition of GaN from zincblende (cubic) to wurtzite (hexagonal) structures is much dependent on the growth temperature. Transmission electron microscopy (TEM) observations demonstrate that the GaN grown layers have the cubic structure (c-GaN) and contain bands of stacking faults (SFs) parallels to {111} planes. For low growth temperatures (similar to 900 degrees C), XRD results demonstrate that the GaN grown layers with the cubic phase purity higher than 85% were obtained. No different types of single diffraction spots, indicating the incorporation of single-crystal h-GaN, on the selected area diffraction (SAD) pattern was observed. It is also found that a density of SI's decreases with the distance from the interface of c-GaN/GaAs. On the other hand, GaN layers exhibited a transition from cubic to mixed cubic/hexagonal phase under conditions of increasing growth temperature (similar to 960 degrees C) as determined using TEM-SAD technique with complementary XRD and PL observations. In addition, the optical characteristics of c-GaN layers are shown to be very sensitive to the presence of the single-crystal h-GaN. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:4393 / 4396
页数:4
相关论文
共 21 条
[1]  
AKASAKI I, 1995, JPN J APPL PHYS 2, V34, P1517
[2]   P-TYPE CONDUCTION IN MG-DOPED GAN TREATED WITH LOW-ENERGY ELECTRON-BEAM IRRADIATION (LEEBI) [J].
AMANO, H ;
KITO, M ;
HIRAMATSU, K ;
AKASAKI, I .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1989, 28 (12) :L2112-L2114
[3]   METALORGANIC VAPOR-PHASE EPITAXIAL-GROWTH OF A HIGH-QUALITY GAN FILM USING AN AIN BUFFER LAYER [J].
AMANO, H ;
SAWAKI, N ;
AKASAKI, I ;
TOYODA, Y .
APPLIED PHYSICS LETTERS, 1986, 48 (05) :353-355
[4]   HOT-ELECTRON MICROWAVE CONDUCTIVITY OF WIDE BANDGAP SEMICONDUCTORS [J].
DAS, P ;
FERRY, DK .
SOLID-STATE ELECTRONICS, 1976, 19 (10) :851-855
[5]   TRANSMISSION ELECTRON-MICROSCOPE OBSERVATION OF CUBIC GAN GROWN BY METALORGANIC VAPOR-PHASE EPITAXY WITH DIMETHYLHYDRAZINE ON (001) GAAS [J].
KUWANO, N ;
NAGATOMO, Y ;
KOBAYASHI, K ;
OKI, K ;
MIYOSHI, S ;
YAGUCHI, H ;
ONABE, K ;
SHIRAKI, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (1A) :18-22
[6]  
MIZUTA M, 1986, JPN J APPL PHYS, V25, P945
[7]  
MIZUTA M, 1986, JPN J APPL PHYS, V25, pL943
[8]  
NAGAMURA S, 1992, JPN J APPL PHYS, V31, P1285
[9]  
NAGAMURA S, 1994, APPL PHYS LETT, V64, P1687
[10]   HIGHLY P-TYPED MG-DOPED GAN FILMS GROWN WITH GAN BUFFER LAYERS [J].
NAKAMURA, S ;
SENOH, M ;
MUKAI, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1991, 30 (10A) :L1708-L1711