Effects of superimposed pulse bias on TiN coating in cathodic arc deposition

被引：0

作者：

Li, ZY ^{[1
]}

Zhu, WB ^{[1
]}

Zhang, Y ^{[1
]}

Li, GY ^{[1
]}

Cao, E ^{[1
]}

机构：

[1] Chinese Acad Sci, Inst Mech, Beijing 100080, Peoples R China

来源：

SURFACE & COATINGS TECHNOLOGY | 2000年 / 131卷 / 1-3期

关键词：

pulse bias; orthogonal design; cathodic arc;

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Orthogonal designs are used to investigate the main factors when doing experiments in which pulse bias is superimposed on d.c. bias during cathodic are deposition of TiN. Pulse peak, duty cycle, frequency, direct voltage, are current and pressure all are investigated when coating TiN on HSS substrates. Roughness, surface micrograph, microhardness and thickness are tested. By analysis of variance, it is shown that pressure and frequency are the main factors. R-a and droplet density of the film with (d.c. + pulse) bias decrease. A simple explanation for the result is suggested. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：158 / 161

页数：4

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