On the transmission function of an ion-energy and mass spectrometer

被引:50
作者
Hamers, EAG
van Sark, WGJHM
Bezemer, J
Goedheer, WJ
van der Weg, WF
机构
[1] Univ Utrecht, Debye Res Inst, Dept Atom & Interface Phys, NL-3508 TA Utrecht, Netherlands
[2] EURATOM, FOM, Inst Plasmafys Rijnhuizen, NL-3430 BE Nieuwegein, Netherlands
关键词
transmission function; mass spectrometer; electrostatic energy analyser;
D O I
10.1016/S0168-1176(97)00285-1
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
The operation of a mass spectrometer system with an electrostatic energy analyser, designed for measurements of mass-resolved ion-energy distributions, is discussed. We show how the electric fields in the different electrostatic lenses present in the system can be optimized. These lenses direct the ions entering the system into the energy filter and the quadrupole mass filter. These lenses can exhibit chromatic aberration. The conditions without chromatic aberration have been found by simulating the ion trajectories in the part of the system up to the energy filter. Also, an experimental method is presented to find these settings. We show that the energy-dependent transmission of ions through the system is mainly determined by its acceptance angle. Ion-energy spectra from an argon plasma have been measured and corrected for the transmission of the ions through the system. Published by Elsevier Science B.V.
引用
收藏
页码:91 / 98
页数:8
相关论文
共 11 条
[1]   SIMION PC/PS2 ELECTROSTATIC LENS DESIGN PROGRAM [J].
DAHL, DA ;
DELMORE, JE ;
APPELHANS, AD .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1990, 61 (01) :607-609
[2]   RECONSTRUCTION OF THE TIME-AVERAGED SHEATH POTENTIAL PROFILE IN AN ARGON RADIOFREQUENCY PLASMA USING THE ION ENERGY-DISTRIBUTION [J].
FIVAZ, M ;
BRUNNER, S ;
SCHWARZENBACH, W ;
HOWLING, AA ;
HOLLENSTEIN, C .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1995, 4 (03) :373-378
[3]   Ion energy distributions in silane-hydrogen plasmas [J].
Hamers, EAG ;
VanSark, WGJHM ;
Bezemer, J ;
VanderWeg, WF ;
Goedheer, WJ .
AMORPHOUS SILICON TECHNOLOGY - 1996, 1996, 420 :461-466
[4]   TIME-RESOLVED MEASUREMENTS OF HIGHLY POLYMERIZED NEGATIVE-IONS IN RADIO-FREQUENCY SILANE PLASMA DEPOSITION EXPERIMENTS [J].
HOWLING, AA ;
SANSONNENS, L ;
DORIER, JL ;
HOLLENSTEIN, C .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (03) :1340-1353
[5]   MASS-SPECTROMETRY DETECTION OF SIHM AND CHM RADICALS FROM SIH4-CH4-H-2 RF DISCHARGES UNDER HIGH-TEMPERATURE DEPOSITION CONDITIONS OF SILICON-CARBIDE [J].
KAENUNE, P ;
PERRIN, J ;
GUILLON, J ;
JOLLY, J .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7B) :4303-4307
[6]   ION-BOMBARDMENT IN RF-PLASMAS [J].
LIU, J ;
HUPPERT, GL ;
SAWIN, HH .
JOURNAL OF APPLIED PHYSICS, 1990, 68 (08) :3916-3934
[7]   KINETIC-ENERGY DISTRIBUTIONS OF IONS SAMPLED FROM ARGON PLASMAS IN A PARALLEL-PLATE, RADIOFREQUENCY REFERENCE CELL [J].
OLTHOFF, JK ;
VANBRUNT, RJ ;
RADOVANOV, SB ;
REES, JA ;
SUROWIEC, R .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (01) :115-125
[8]  
Rossnagel S M., 1990, Handbook of Plasma Processing Technology
[9]   ION-BOMBARDMENT ENERGY-DISTRIBUTIONS IN RADIOFREQUENCY GLOW-DISCHARGE SYSTEMS [J].
THOMPSON, BE ;
ALLEN, KD ;
RICHARDS, AD ;
SAWIN, HH .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (06) :1890-1903
[10]   ION AND ELECTRON DYNAMICS IN THE SHEATH OF RADIOFREQUENCY GLOW-DISCHARGES [J].
WILD, C ;
KOIDL, P .
JOURNAL OF APPLIED PHYSICS, 1991, 69 (05) :2909-2922