Deposition and properties of B-N codoped p-type ZnO thin films by RF magnetron sputtering

被引:14
作者
Sui, Y. R. [1 ,2 ]
Yao, B. [1 ,3 ]
Yang, J. H. [2 ]
Cui, H. F. [1 ]
Huang, X. M. [1 ]
Yang, T. [1 ]
Gao, L. L. [1 ]
Deng, R. [1 ]
Shen, D. Z. [3 ]
机构
[1] Jilin Univ, Dept Phys, Changchun 130023, Peoples R China
[2] Jilin Normal Univ, Dept Phys, Siping 136000, Peoples R China
[3] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Changchun 130033, Peoples R China
基金
中国国家自然科学基金;
关键词
Zinc oxide; B-N codoping; p-Type conduction; Sputtering; Properties; DOPED ZNO; LUMINESCENCE; EXCITON; STATES;
D O I
10.1016/j.apsusc.2009.11.017
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
B-N codoped p-type ZnO thin films have been realized by radio frequency (rf) magnetron sputtering using a mixture of argon and oxygen as sputtering gas. Types of conduction and electrical properties in codoped ZnO films were found to be dependent on oxygen partial pressure ratios in the sputtering gas mixture. When oxygen partial pressure ratio was 70%, the codoped ZnO film showed p-type conduction and had the best electrical properties. Additionally, the p-ZnO/n-Si heterojunction showed a clear p-n diode characteristic. XRD results indicate that the B-N codoped ZnO film prepared in 70% oxygen partial pressure ratio has high crystal quality with (0 0 2) preferential orientation. Meanwhile, the B-N codoped ZnO film has high optical quality and displays the stronger near band edge (NBE) emission in the temperature-dependent photoluminescence spectrum, the acceptor energy level was estimated to be located at 125 meV above the valence band. (C) 2009 Elsevier B. V. All rights reserved.
引用
收藏
页码:2726 / 2730
页数:5
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