Large-Signal RF Performance of Nanocrystalline Diamond Coated AlGaN/GaN High Electron Mobility Transistors

被引:35
作者
Meyer, David J. [1 ]
Feygelson, Tatyana I. [1 ]
Anderson, Travis J. [1 ]
Roussos, Jason A. [1 ]
Tadjer, Marko J. [1 ,2 ]
Downey, Brian P. [1 ]
Katzer, D. Scott [1 ]
Pate, Bradford B. [1 ]
Ancona, Mario G. [1 ]
Koehler, Andrew D. [1 ]
Hobart, Karl D. [1 ]
Eddy, Charles R., Jr. [1 ]
机构
[1] US Naval Res Lab, Washington, DC 20375 USA
[2] Amer Soc Engn Educ, Washington, DC 20375 USA
关键词
NCD; load-pull; amplifier; reliability; HEMTS;
D O I
10.1109/LED.2014.2345631
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this split-wafer study, we have compared the dc, pulsed, small and large signal RF electrical performance of nanocrystalline diamond (NCD) coated AlGaN/GaN high electron mobility transistors (HEMTs) to reference devices with silicon nitride passivation only. The NCD-coated HEMTs were observed to outperform reference devices in transconductance, large-signal gain, output power density, and power-added efficiency at 4 GHz. The measured improvements were suspected to be related to reduced dispersion and lower source access resistance afforded by the NCD film.
引用
收藏
页码:1013 / 1015
页数:3
相关论文
共 14 条
[1]   Diamond overgrown InAlN/GaN HEMT [J].
Alomari, M. ;
Dipalo, M. ;
Rossi, S. ;
Diforte-Poisson, M. -A. ;
Delage, S. ;
Carlin, J. -F. ;
Grandjean, N. ;
Gaquiere, C. ;
Toth, L. ;
Pecz, B. ;
Kohn, E. .
DIAMOND AND RELATED MATERIALS, 2011, 20 (04) :604-608
[2]   Fully coupled thermoelectromechanical analysis of GaN high electron mobility transistor degradation [J].
Ancona, M. G. ;
Binari, S. C. ;
Meyer, D. J. .
JOURNAL OF APPLIED PHYSICS, 2012, 111 (07)
[3]  
Anderson T. J., 2012, 2012 70th Annual Device Research Conference (DRC), P155, DOI 10.1109/DRC.2012.6256985
[4]  
Bozorg-Grayeli E., 2013, APPL PHYS LETT, V102
[5]   High-performance enhancement-mode AlGaN/GaN HEMTs using fluoride-based plasma treatment [J].
Cai, Y ;
Zhou, YG ;
Chen, KJ ;
Lau, KM .
IEEE ELECTRON DEVICE LETTERS, 2005, 26 (07) :435-437
[6]   Full-Wafer Characterization of AlGaN/GaN HEMTs on Free-Standing CVD Diamond Substrates [J].
Chabak, Kelson D. ;
Gillespie, James K. ;
Miller, Virginia ;
Crespo, Antonio ;
Roussos, Jason ;
Trejo, Manuel ;
Walker, Dennis E., Jr. ;
Via, Glen D. ;
Jessen, Gregg H. ;
Wasserbauer, John ;
Faili, Firooz ;
Babic, Dubravko I. ;
Francis, Daniel ;
Ejeckam, Felix .
IEEE ELECTRON DEVICE LETTERS, 2010, 31 (02) :99-101
[7]   AlGaN/GaN HEMTs on diamond substrate with over 7W/mm output power density at 10 GHz [J].
Dumka, D. C. ;
Chou, T. M. ;
Faili, F. ;
Francis, D. ;
Ejeckam, F. .
ELECTRONICS LETTERS, 2013, 49 (20) :1298-U88
[8]   Impact of Water-Assisted Electrochemical Reactions on the OFF-State Degradation of AlGaN/GaN HEMTs [J].
Gao, Feng ;
Tan, Swee Ching ;
del Alamo, Jesus A. ;
Thompson, Carl V. ;
Palacios, Tomas .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (02) :437-444
[9]   Molecular beam epitaxy of beryllium-doped GaN buffer layers for AlGaN/GaN HEMTs [J].
Katzer, DS ;
Storm, DF ;
Binari, SC ;
Roussos, JA ;
Shanabrook, BV ;
Glaser, ER .
JOURNAL OF CRYSTAL GROWTH, 2003, 251 (1-4) :481-486
[10]   Self-aligned ALD AlOx T-gate insulator for gate leakage current suppression in SiNx-passivated AlGaN/GaN HEMTs [J].
Meyer, David J. ;
Bass, Robert ;
Katzer, D. Scott ;
Deen, David A. ;
Binari, Steven C. ;
Daniels, Kevin M. ;
Eddy, Charles R., Jr. .
SOLID-STATE ELECTRONICS, 2010, 54 (10) :1098-1104