Chemically resolved depth profiles extracted from ARXPS data taken on polystyrene surfaces exposed to nitrogen plasmas

被引：13

作者：

Paynter, R. W.

Roy-Guay, D.

机构：

[1] INRS Energie, EMT, Varennes, PQ J3X 1S2, Canada

[2] Univ Sherbrooke, Dept Phys, Sherbrooke, PQ J1K 2R1, Canada

来源：

PLASMA PROCESSES AND POLYMERS | 2007年 / 4卷 / 04期

关键词：

angle-resolved XPS; diffusion; ESCA; nitrogen plasma; surfaces;

D O I：

10.1002/ppap.200600093

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Polystyrene samples were exposed to a nitrogen plasma for 30 s, 1, 2, and 4 min, and analyzed by angle-resolved photoelectron spectroscopy. Oxygen and nitrogen adatom depth profiles were extracted from the elemental peak intensities using a maximum entropy method. The same method was used to extract chemically resolved carbon-adatom depth profiles by peak fitting the C1s spectra. The elemental nitrogen and carbon-adatom depth profiles were observed to evolve initially and then stabilize for plasma exposures of 2 min and more. A comparison of the elemental and chemically resolved depth profiles provided an additional information on the evolution of the carbon-adatom bonding as a function of plasma duration.

引用

页码：406 / 413

页数：8

共 28 条

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