Newly developed mask inspection system with DUV laser illumination

被引：10

作者：

Oohashi, K ^{[1
]}

Inoue, H ^{[1
]}

Nomura, T ^{[1
]}

Ono, A ^{[1
]}

Tabata, M ^{[1
]}

Suzuki, H ^{[1
]}

机构：

[1] Toshiba Corp, Corp Mfg Engn Ctr, Isogo Ku, Yokohama, Kanagawa 2350017, Japan

来源：

PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY VII | 2000年 / 4066卷

关键词：

DUV laser; laser illumination; speckle noise; phase plate;

D O I：

10.1117/12.392086

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A new mask inspection system for 150nm and 130nm semiconductor devices which utilizes a DUV laser of 257nm wavelength for an inspection illumination has been developed. A newly developed optical phase shift disk cancels the speckle noise caused by the high coherency of a laser. The phase shift disk has micro pits with different depths disposed randomly over the entire plate surface. The speckle pattern changes randomly by rotating the plate, and averaging pattern image by Time Delay Integration (TDI) sensor cancels the speckle noise of the laser illumination. Using this method, inspection of masks was realized at DUV wavelength.

引用

页码：452 / 461

页数：10