To what extent can design of molecular precursors control the preparation of high tech oxides?

被引：77
作者：
Hubert-Pfalzgraf, LG [1 ]
机构：
[1] Univ Lyon 1, IRC, F-69622 Villeurbanne, France
来源：
JOURNAL OF MATERIALS CHEMISTRY | 2004年 / 14卷 / 21期
关键词：
D O I：
10.1039/b407204a
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Using metal alkoxides as synthetic platforms allows molecular design of homo and heterometallic oxide precursors. Bottom-up approaches to materials such as sol-gel or CVD techniques provide the flexibility needed by the technological demands. Relationships between precursors and materials will be illustrated on non-silicon systems.
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页码：3113 / 3123
页数：11
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