Gate-Tunable Graphene-WSe2 Heterojunctions at the Schottky-Mott Limit

被引:67
作者
LaGasse, Samuel W. [1 ,2 ]
Dhakras, Prathamesh [1 ,2 ]
Watanabe, Kenji [3 ]
Taniguchi, Takashi [3 ]
Lee, Ji Ung [1 ,2 ]
机构
[1] SUNY Albany, Polytech Inst, Coll Nanoscale, Albany, NY 12203 USA
[2] SUNY Albany, Polytech Inst, Coll Sci & Engn, Albany, NY 12203 USA
[3] Natl Inst Mat Sci, 1-1 Namiki, Tsukuba, Ibaraki 3050044, Japan
基金
美国国家科学基金会;
关键词
2D materials; Fermi level pinning; graphene; Schottky junctions; Schottky-Mott limit; van der Waals heterostructures; HETEROSTRUCTURE; TRANSPORT; MOBILITY; DEVICE;
D O I
10.1002/adma.201901392
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Metal-semiconductor interfaces, known as Schottky junctions, have long been hindered by defects and impurities. Such imperfections dominate the electrical characteristics of the junction by pinning the metal Fermi energy. Here, a graphene-WSe2 p-type Schottky junction, which exhibits a lack of Fermi level pinning, is studied. The Schottky junction displays near-ideal diode characteristics with large gate tunability and small leakage currents. Using a gate electrostatically coupled to the WSe2 channel to tune the Schottky barrier height, the Schottky-Mott limit is probed in a single device. As a special manifestation of the tunable Schottky barrier, a diode with a dynamically controlled ideality factor is demonstrated.
引用
收藏
页数:5
相关论文
共 30 条
  • [1] SURFACE STATES AND RECTIFICATION AT A METAL SEMI-CONDUCTOR CONTACT
    BARDEEN, J
    [J]. PHYSICAL REVIEW, 1947, 71 (10): : 717 - 727
  • [2] High Mobility WSe2 p- and n-Type Field-Effect Transistors Contacted by Highly Doped Graphene for Low-Resistance Contacts
    Chuang, Hsun-Jen
    Tan, Xuebin
    Ghimire, Nirmal Jeevi
    Perera, Meeghage Madusanka
    Chamlagain, Bhim
    Cheng, Mark Ming-Cheng
    Yan, Jiaqiang
    Mandrus, David
    Tomanek, David
    Zhou, Zhixian
    [J]. NANO LETTERS, 2014, 14 (06) : 3594 - 3601
  • [3] Cui X, 2015, NAT NANOTECHNOL, V10, P534, DOI [10.1038/nnano.2015.70, 10.1038/NNANO.2015.70]
  • [4] Boron nitride substrates for high-quality graphene electronics
    Dean, C. R.
    Young, A. F.
    Meric, I.
    Lee, C.
    Wang, L.
    Sorgenfrei, S.
    Watanabe, K.
    Taniguchi, T.
    Kim, P.
    Shepard, K. L.
    Hone, J.
    [J]. NATURE NANOTECHNOLOGY, 2010, 5 (10) : 722 - 726
  • [5] Tunable Schottky barrier and high responsivity in graphene/Sinanotip optoelectronic device
    Di Bartolomeo, Antonio
    Giubileo, Filippo
    Luongo, Giuseppe
    Iemmo, Laura
    Martucciello, Nadia
    Niu, Gang
    Fraschke, Mirko
    Skibitzki, Oliver
    Schroeder, Thomas
    Lupina, Grzegorz
    [J]. 2D MATERIALS, 2017, 4 (01):
  • [6] Van der Waals heterostructures
    Geim, A. K.
    Grigorieva, I. V.
    [J]. NATURE, 2013, 499 (7459) : 419 - 425
  • [7] High-Performance Two-Dimensional Schottky Diodes Utilizing Chemical Vapour Deposition-Grown Graphene-MoS2 Heterojunctions
    Huang, Hefu
    Xu, Wenshuo
    Chen, Tongxin
    Chang, Ren-Jie
    Sheng, Yuewen
    Zhang, Qianyang
    Hou, Linlin
    Warner, Jamie H.
    [J]. ACS APPLIED MATERIALS & INTERFACES, 2018, 10 (43) : 37258 - 37266
  • [8] METAL GALLIUM SELENIDE INTERFACES - OBSERVATION OF THE TRUE SCHOTTKY LIMIT
    HUGHES, GJ
    MCKINLEY, A
    WILLIAMS, RH
    MCGOVERN, IT
    [J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1982, 15 (06): : L159 - L164
  • [9] Tunable Graphene-GaSe Dual Heterojunction Device
    Kim, Wonjae
    Li, Changfeng
    Chaves, Ferney A.
    Jimenez, David
    Rodriguez, Raul D.
    Susoma, Jannatul
    Fenner, Matthias A.
    Lipsanen, Harri
    Riikonen, Juha
    [J]. ADVANCED MATERIALS, 2016, 28 (09) : 1845 - 1852
  • [10] Electrical Characteristics of Multilayer MoS2 FET's with MoS2/Graphene Heterojunction Contacts
    Kwak, Joon Young
    Hwang, Jeonghyun
    Calderon, Brian
    Alsalman, Hussain
    Munoz, Nini
    Schutter, Brian
    Spencer, Michael G.
    [J]. NANO LETTERS, 2014, 14 (08) : 4511 - 4516