A self-bended piezoresistive microcantilever flow sensor for low flow rate measurement

被引:88
|
作者
Zhang, Qi [1 ]
Ruan, Wenzhou [1 ]
Wang, Han [1 ]
Zhou, Youzheng [1 ]
Wang, Zheyao [1 ]
Liu, Litan [1 ]
机构
[1] Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
关键词
Microcantilever; Flow sensor; Residue stress; Curved-up; MEMS; FABRICATION; VELOCITY; DESIGN;
D O I
10.1016/j.sna.2010.02.002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents the fabrication and characterization of a curved-up piezoresistive microcantilever flow sensor. The microcantilever sensor, fabricated with silicon-on-insulator (SOI) wafers, consists of two layers of silicon dioxide and a silicon piezoresistor in-between. The difference in the residual stresses between silicon and silicon dioxide layers curves the microcantilever upwards and the free-end bends out of plane. The curved-up microcantilever transfers fluidic momentum that acts on it to drag force, which bends the curved-up microcantilever and changes the resistance of the piezoresistor. This configuration has the advantage of high sensitivity for low flow rate measurement and allows the microcantilever to be integrated in microchannels to measure steady flow. The flow sensor is calibrated with respect to low flow rates at range of 0-20 cm/s. The sensitivity, repeatability, and zero drift are characterized in detail. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:273 / 279
页数:7
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