A 256-kb 65-nm sub-threshold SRAM design for ultra-low-voltage operation

被引:282
作者
Calhoun, Benton Highsmith [1 ]
Chandrakasan, Anantha P.
机构
[1] Univ Virginia, Dept Elect & Comp Engn, Charlottesville, VA 22904 USA
[2] MIT, Dept Elect Engn, Cambridge, MA 02139 USA
关键词
low-voltage memory; sub-threshold SRAM; voltage scaling;
D O I
10.1109/JSSC.2006.891726
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Low-voltage operation for memories is attractive because of lower leakage power and active energy, but the challenges of SRAM design tend to increase at lower voltage. This paper explores the limits of low-voltage operation for traditional six-transistor (6 T) SRAM and proposes an alternative bitcell that functions to much lower voltages. Measurements confirm that a 256-kb 65-nm SRAM test chip using the proposed bitcell operates into sub-threshold to below 400 mV. At this low voltage, the memory offers substantial power and energy savings at the cost of speed, making it well-suited to energy-constrained applications. The paper provides measured data and analysis on the limiting effects for voltage scaling for the test chip.
引用
收藏
页码:680 / 688
页数:9
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