Direct microfabrication of chalcogenide glasses by light and electron-beam exposures

被引：7

作者：

Tanaka, K ^{[1
]}

Yoshida, N ^{[1
]}

机构：

[1] Hokkaido Univ, Fac Engn, Dept Appl Phys, Sapporo, Hokkaido 060, Japan

来源：

SOLID STATE PHENOMENA | 1997年 / 55卷

关键词：

chalcogenide glass; micropattern; photoexpansion; ionic migration; electron beam; microlens; grating;

D O I：

10.4028/www.scientific.net/SSP.55.153

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Three kinds of direct micropatterning processes in chalcogenide glasses are introduced, and the mechanisms are discussed. These are giant photoexpansion appearing in As2S3, electron-beam induced deformation in As2S3, and electron-beam-induced Ag accumulation in Ag-chalcogenide glasses. These processes can be utilized to fabricate relief patterns without employing any etching procedures.

引用

页码：153 / 158

页数：6

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