Cathode voltage and discharge current oscillations in HiPIMS

被引：18

作者：

Klein, P. ^{[1
]}

Hnilica, J. ^{[1
]}

Hubicka, Z. ^{[2
]}

Cada, M. ^{[2
]}

Slapanska, M. ^{[1
]}

Zemanek, M. ^{[1
]}

Vasina, P. ^{[1
]}

机构：

[1] Masaryk Univ, Dept Phys Elect, Kotlarska 2, CZ-61137 Brno, Czech Republic

[2] Acad Sci Czech Republ, Inst Phys Vvi, Slovance 1999-2, CZ-18221 Prague, Czech Republic

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 2017年 / 26卷 / 05期

关键词：

HiPIMS; voltage and current oscillations; spokes; MAGNETRON DISCHARGE; POWER DENSITIES; INHOMOGENEITIES;

D O I：

10.1088/1361-6595/aa62ee

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

This. paper reports on the oscillations both on the cathode voltage and on the discharge current which emerged suddenly and simultaneously during a. high- power impulse magnetron sputtering pulse. Detailed. experiments identified the pressure and the discharge current ranges to detect these oscillations. The oscillations. originated. from the magnetized plasma and their frequency ranged from 225 kHz to 400 kHz depending on the experimental conditions. Simultaneous measurement of both oscillations and spokes was conducted to find mutual correlations. The oscillations always accompanied the spokes and no particular conditions to detect oscillations in the. absence of. spokes were found. The oscillations were not caused by the rotational motion of the spokes but. emerged when a. certain threshold amount of spokes was overreached.

引用

页数：12

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