Improvement of uneven color of TiN films deposited by arc discharge ion plating

被引：0
|
作者：
Suzuki, A [1 ]
机构：
[1] Nihon Seimitsu Co Ltd, Kitakatsushika, Saitama 3450023, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 6A期
关键词：
arc discharge ion plating; decorative film; L*a*b* color space;
D O I：
10.1143/JJAP.39.3603
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The are discharge ion plating technique has been widely applied for manufacturing decorative films such as TiN. This technique utilizes an electron beam gun for evaporation, an ionization electrode for are discharge and a filament for the promotion of ionization. However, according to the position of the ionization electrode and filament, the films exhibit uneven coloring. New positions of the ionization electrode and the filament are devised. The color uniformity is improved using a filament which is placed under the electron beam passageway.
引用
收藏
页码：3603 / 3604
页数：2
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